Electrical resistivity and metal-nonmetal transition in n-type doped 4H-SiC.

Abstract

The electrical resistivity of 4H-SiC doped with nitrogen is analyzed in the temperature range 10–700 K for nitrogen concentrations between 3.5×1015 and 5×1019 cm−3. For the highest doped samples, a good agreement is found between the experimental resistivity and the values calculated from a generalized Drude approach at similar dopant concentration and temperature. From these results, the critical concentration (Nc) of nitrogen impurities which corresponds to the metal-nonmetal transition in 4H-SiC is deduced. We find Nc∼1019 cm−3.